(2003). Physics and technology of high-k gate dielectrics I: Proceedings of the International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues : held in Salt Lake City, Utah, October 20-24, 2002 / editors, S. Kar ... [and others] ; sponsoring divisions: Dielectric Science and Technology, and Electronics.
Citação norma ChicagoPhysics and Technology of High-k Gate Dielectrics I: Proceedings of the International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues : Held in Salt Lake City, Utah, October 20-24, 2002 / Editors, S. Kar ... [and Others] ; Sponsoring Divisions: Dielectric Science and Technology, and Electronics. 2003.
Citação norma MLAPhysics and Technology of High-k Gate Dielectrics I: Proceedings of the International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues : Held in Salt Lake City, Utah, October 20-24, 2002 / Editors, S. Kar ... [and Others] ; Sponsoring Divisions: Dielectric Science and Technology, and Electronics. 2003.