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Format: Book
Language:English
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format Book
genre
geographic
id c71a1dca-d9f5-46b5-a205-8fa7cdfaed79
isbn 1566774632
issn
language eng
physical xv, 634 pages :illustrations ;24 cm.
publication – publisher: Electrochemical Society
  dateOfPublication: 2005
publishDate 2005
subjects
title Advanced gate stack, source/drain and channel engineering for Si-based CMOS : new materials, processes, and equipment : proceedings of the international symposium / editors, Evgeni P. Gusev ... [and others]
topic Metal oxide semiconductors, Complementary.
Metal oxide semiconductors
Gate array circuits
Conference papers and proceedings.